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Source: Micromachines. 2023. Vol. 14, № 10. P. 1875 (1-14)
Type: статьи в журналах
Date: 2023
Description:
The gas sensitivity and structural properties of TiO2 thin films deposited by plasma-enhanced atomic layer deposition (ALD) were examined in detail. The TiO2 thin films are deposited using Tetrakis(di
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Source: Superlattices and microstructures. 2020. Vol. 139. P. 106392 (1-12)
Type: статьи в журналах
Date: 2020
Description:
This article reveals the gas-sensitive properties of polycrystalline gallium oxide thin films with chromium additives. Incorporation of the Cr2O3 phase into the β-phase gallium oxide film structure le
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