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Source: Semiconductors. 2015. Vol. 49, № 8. P. 1012-1018
Type: статьи в журналах
Date: 2015
Description:
The effects of thermal annealing and exposure to oxygen plasma on the electrical and photoelectric properties of metal-TiO2-Si structures are investigated. The TiO2 films are fabricated by the rf magn
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Source: Semiconductors. 2012. Vol. 46, № 8. P. 1003-1007
Type: статьи в журналах
Date: 2012