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Source: Micromachines. 2023. Vol. 14, № 10. P. 1875 (1-14)
Type: статьи в журналах
Date: 2023
Description:
The gas sensitivity and structural properties of TiO2 thin films deposited by plasma-enhanced atomic layer deposition (ALD) were examined in detail. The TiO2 thin films are deposited using Tetrakis(di
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Authors:
Almaev, Aleksei V. |
Kopyev, Viktor V. |
Novikov, Vadim A. |
Chikiryaka, Andrei V. |
Yakovlev, Nikita N. |
Usseinov, Abay B. |
Karipbayev, Zhakyp T. |
Akilbekov, Abdirash T. |
Koishybayeva, Zhanymgul K. |
Popov, Anatoli I.
Source: Materials. 2023. Vol. 16, № 1. P. 342 (1-16)
Type: статьи в журналах
Date: 2023
Description:
Indium tin oxide thin films were deposited by magnetron sputtering on ceramic aluminum nitride substrates and were annealed at temperatures of 500 °C and 600 °C. The structural, optical, electrically
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