Электронная библиотека (репозиторий) Томского государственного университета
ионная имплантация

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Add   Annealing kinetics of radiation defects in boron-implanted p-Hg1-xCdxTe
Authors: Talipov, Niyaz H. | Voytsekhovskiy, Alexander V.
Source: Semiconductor science and technology. 2018. Vol. 33, № 6. P. 065009 (1-8)
Type: статьи в журналах
Date: 2018
Description: The results of studying the annealing kinetics of the radiation-induced donor-type defects in boron implanted p-type Hg1−x Cd x Te (MCT) are presented. The annealing kinetics of the radiation donor ce ... More
Add   Ion implantation and ion milling in MBE Hg1-xCdxNe films
Authors: Voytsekhovskiy, Alexander V. | Grigoryev, Denis V. | Mikhailov, Nikolay N. | Talipov, Niyaz H. | Mynbaev, Karim D. | Izhnin, Igor I. | Fitsych, Olena I.
Source: Nuclear instruments and methods in physics research B. 2012. Vol. 272. P. 313-317
Type: статьи в журналах
Date: 2012
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