Hardening by ion implantation of VT1-0 alloy having different grain size

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Hardening by ion implantation of VT1-0 alloy having different grain size	812 KB	Adobe Acrobat PDF	Read	Download
DOI Доступ к ресурсу на сайте издателя			10.1063/1.4937852

Title: Hardening by ion implantation of VT1-0 alloy having different grain size
Creator: Nikonenko, Alisa V.
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Nikonenko, Elena L.
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Kalashnikov, Mark P.
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Kurzina, Irina A.
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Popova, Natalja A.
Date: 2016
DOI: 10.1063/1.4937852
Description: The paper presents a transmission electron microscopy (TEM) study of the structural and phase state of commercially pure titanium implanted by aluminum ions. TEM study has been carried out for two types of grains, namely coarse (0.4 µm) and small (0.5 µm). This paper presents details of the yield stress calculations and the analysis of strength components for the both grain types in two areas of the modified layer: at a distance of 0-150 nm (surface area I) and ∼300 nm (central area II) from the irradiated surface. It is shown that the ion implantation results in a considerable hardening of the entire thickness of the implanted layer in the both grain types. The grain size has, however, a different effect on the yield stress in areas I and II. Thus, near the ion-alloyed layer, the yield stress decreases with the increase of the grain size, whilst area II demonstrates its increase. Moreover, the contribution to the general hardening of the alloy made by certain hardening mechanisms differs from contributions made by each of these mechanisms in each certain case.