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Source: Journal of Physics: Conference Series. 2015. Vol. 652. P. 012020 (1-5)
Type: статьи в журналах
Date: 2015
Description:
The paper reports on the chemical composition of titanium nitride (TiN) and silicon (Si) coatings deposited with a new technological vacuum plasma setup which comprises magnetron sputtering systems, a
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Source: Известия высших учебных заведений. Физика. 2014. Т. 57, № 3/2. С. 62-64
Type: статьи в журналах
Date: 2014